给出了线性阳极层离子源磁路的设计。
Design of the magnetic loop for the linear anode layer ion source was given.
论述了冷阴极离子源及其在真空镀膜中的应用。
In vacuum deposition, using of the cold cathode ion source can reduce the deposition period.
该理论原则上也适用于其它类型质谱计的离子源。
This theory is also applicable to the ion sources used in other mass spectrometers.
在中子发生器中采用ECR离子源是一种新技术。
It is a new technology to apply an ECR ion source to the neutron generator.
本文叙述了液态金属镓离子源的制做方法和特性研究。
In this paper, we have described the manufacturing method of liquid metal Ga ion source (LMIS) and its properties.
并且详细论述离子刻蚀的原理以及离子源的参数设计。
The theory of ion etching and the parameter of ion source designing are discussed in detail.
电喷雾离子源（ESI），以选择性正离子方式检测；
The compound was ionized in the electrospray ionization(ESI) and operated in positive mode.
非直接加热阴极式离子源的阴极被至少一个杆或钉支撑。
A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin.
本文系统地描述了强流表面电离离子源的工作原理和结构。
The working principle and structure of a surface ionization ion source with high current is described systematically.
如果离子源偏离地电位，那么离子收集电极多半处在地电位。
If the source of ions is biased off ground, then the ion collector will most likely be at ground potential.
实验结果表明：气体离子源具有明显的细化金属颗粒的作用。
The experiment shows that the gas ion source provides obvious pulverization for metal particles.
叙述了为纳米聚焦离子束装置研制的镓液态金属离子源的制备。
In this paper, Development of liquid metal ion source for nanometer focused ion beam system is introduced.
这种新型离子源具有改善直接进样技术和提高分析灵敏度的潜力。
This new kind of ion source has the potentiality of improving direct sample introduction technique and analysis sensitivity.
高频离子源管道式引出电极的几何参数对束流引出具有重要影响。
The geometry of the pipe shaped extraction electrode of the RF ion source may strongly affect the extracted ion beam.
叙述了用金属筒来增强ECR2离子源的高电荷态离子束流强度。
The enhancement of charge state ion beam intensities in ECR2 ion source with metal tube is introduced in the paper.
介绍了一种低功率圆柱形阳极层离子源的工作特性和束流分布特性。
A low power cylindrical anode layer ion source and its working characteristic, and the beam distribution are introduced.
给出了某些定量关系，为磁四极场用于高频离子源提供了实验依据。
Some quantitative relations are given, and experimental evidence is provided for the use of the magnetic quadrupole field in high frequency ion source.
这是一种新型的强流金属离子源，特别适用于离子注入、材料改性。
As a new kind of intense current metal ion source, it is very suitable for the application of ion implantation and material modification.
本文介绍永磁镜场边引出PIG离子源的结构、磁场设计和实验结果。
This paper describes a newly designed side extraction PIG ion source which possesses magnetic mirror field produced by a permanent magnet.
本文研究了利用双等离子源产生多种离子束以及它们的束流引出特性。
The production of several kinds of intense beam and their characteristics of beam extraction from the duoplasmatron source are studied.
对表面-等离子体型桶式负离子源引出系统束光学的性质进行了数值模拟。
It was used to predict the beam optical performance of an extraction system for a surface-plasma bucket negative ion source.
介绍了用于控制分离器上位于高压端的离子源的各种电气参数的光控系统。
An optical control system used for adjusting the source's parameters of an ion separator is described.
设计了用于非弹性散射谱和俘获谱测量的时间、幅度可调离子源脉冲电源。
We have designed a kind of ion source pulse power and it is used in measure of inelastic spectrum and capture spectrum.
它由液态金属离子源，源尖微调装置，离子透镜及静电八极偏转器等组成。
The gun is composed of the liquid metal ion source of Ga, the tip microadjusters' assembly, the ion lens, and the electrostatic octopole deflector.
用热表面离子源测定了锂同位素丰度，在样品全耗尽过程中累计离子流强度。
The isotopic ratio of lithium was determined by cumulating intensity of ion current during evaporation of all samples on evaporation filament.
TITAN离子源是一种新的能够同时产生强金属和气体离子束流的离子源。
TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use.
采用数码相机直接照相的方法来确定真空弧离子源引出束流在加速空间的分布。
Spatial beam distribution of vacuum arc ion source in accelerating area was (determined) using a digital camera.
在光电阴极的制备及对光电阴极作表面分析中，铯离子源较中性铯源具有一定的优点。
In the surface analysis and the manufacture of photocathode the cesium ion source shows some advantages as compared with the neutral cesium source.
将不同单质机械混合，在不增加注入机离子源数目的基础上实现了不同离子的共注入。
To achieve co-implantation without additional ion sources, the required implants are mixed to form a cathode of MEVVA ion source.
将不同单质机械混合，在不增加注入机离子源数目的基础上实现了不同离子的共注入。
To achieve co-implantation without additional ion sources, the required implants are mixed to form a cathode of MEVVA ion source.
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