设计了一种新的紫外或深紫外光刻物镜。
The design of a new kind of UV or DUV lithography lenses is described in this paper.
通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。
The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。
The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
应用推荐