ZHOU S, YAN Y X. Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition[J]. Vacuum, 2005,42(2):15-18.
[12] 周顺，严一心。脉冲真空电弧离子镀在不锈钢上沉积类金刚石薄膜的研究[J]。真空，2005，42（2）：15-18。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
Power in ion deposition arc evaporating unit, type ZXG is specially used for the arc evaporation of multi-arc ion coating equipment.
ZX G型离子沉积电弧蒸发电源装置，专门用于多弧离子镀膜机的电弧蒸发。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
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