A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.
用氢气、丙酮蒸汽为源气体，通过微波增强的化学气相沉积方法，实现了在金刚石表面气相外延生长单晶金刚石薄膜。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
A new kind of silicon oxidic film on aluminum was prepared by chemical vapor deposition (CVD) in ambient pressure.
本研究采用常压化学气相沉积（CVD）的方法在金属铝基底上制备出硅氧化合物陶瓷膜层。
A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation.
本文提出了一种新颖的结合自组装技术和电子束直写曝光以及选择性化学沉积制备图案化薄膜方法。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.
等离子体化学气相沉积技术制备氢化硅薄膜工艺条件成熟稳定而成为薄膜制备的首选方法。
The results show: the amorphous hydrogenated carbon film can be fabricated on PET surface by plasma-enhanced chemical vapor deposition.
研究结果表明：用射频等离子体增强化学气相沉积法，可以在PET上沉积厚度为纳米至微米级的非晶碳氢膜。
In the present paper, the relation between diamond nucleation density and synthesis conditions is studied for the diamond thin film synthesized by hot filament chemical vapour deposition method.
本文研究了用热灯丝化学气相沉积方法在单晶硅衬底上制备金刚石薄膜时其成核密度与制备条件的关系。
Plasma enhanced chemical vapor deposition (PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.
等离子增强化学气相沉积(PECVD)是低温沉积硅膜的主要方法。
Making use of physical or chemical vapor deposition to accumulate to plate the film mutually and reinforces the surface of work strength.
利用物理或者化学气相沉积镀膜，增加工件表面强度。
In order to get stable and high efficiency thin-film CdTe solar cells that the CdTe thin films surface chemical etching before deposition of a metallic contact is very important.
为了获得稳定高效的碲化镉太阳电池，在镀上金属电极前对碲化镉薄膜进行化学腐蚀是很重要的。
In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed.
综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed.
综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
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