The present article introduces a new technique of chemical vapour deposition titanium Carbide.
本文介绍了一种新的化学气相沉积碳化钛方法。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
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