Therefore, novel models for thick chemically amplified photoresist which fit well characters of SU-8 resist is set up.
因而这篇文章包括了我们在厚的化学放大胶光刻模型方面的努力，这些新的模型适用于SU-8胶。
The invention further provides a chemically amplified positive resist composition comprising the salt represented by the formula (I).
本发明还提供含有由上述式（I） 表示的盐的化学放大型抗蚀剂组合物。
The invention further provides a chemically amplified positive resist composition comprising the salt represented by the formula (I).
本发明还提供含有由上述式（I） 表示的盐的化学放大型抗蚀剂组合物。
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