Any plating must have a can produce normal coating the current density range.
任何电镀都必须有一个能产生正常镀层的电流密度范围。
Along with the increase of the current density, cathode polarization effect, coating grain with increasing more and fine.
随着电流密度的增加﹐阴极极化作用随着增加﹐镀层晶粒越来越细。
In general, the Lord salt concentration, temperature increase coating, and under the condition of mixing, can allow the more current density.
一般情况下﹐主盐浓度增大﹐镀层温度升高﹐以及有搅拌的条件下﹐可以允许采用较大的电流密度。
A superconductor's transition temperature and critical current density are two commonly measured parameters.
超导体的转变温度和临界电流密度是两个经常要测量的参数。
The results show that the grain size of tin gradually gets smaller while that of alloy layer gets bigger and bigger with the increasing of current density.
结果表明，随着电流密度的增加，电沉积的锡晶粒度逐渐细化，合金层的晶粒度有变粗的趋势。
Electroplating working conditions is to point to the operation of the when electroplating changes factors, including: current density, temperature, mixing and power of the wave, etc.
电镀工作条件是指电镀时的操作变化因素，包括：电流密度、温度、搅拌和电源的波形等。
Current density: unit under the plating area under current, usually the higher current density film thickness is thicker, but is high coating will scorched thick dry.
电流密度：单位电镀面积下所承受的电流，通常电流密度越高膜厚越厚，但是过高时镀层会烧焦粗燥。
When the current density is too low, the cathode polarization effect, smaller coating, not even orange crystal bulky coating.
当电流密度过低时﹐阴极极化作用较小﹐镀层桔晶粗大﹐甚至没有镀层。
Tunneling process is important in the low to moderate current density range.
在中等电流密度下，隧道穿透过程是重要的。
In accordance with the liquid temperature selection in winter, current density, summer with the lower limit.
依液体温度选择电流密度，冬季用下限，夏季用上限。
Furthermore the distribution and variation of the electrostatic potential and layer ionospheric current density at the northern hemisphere are calculated by the dynamo theory.
继而从发电机理论得到了电离层电位及层电流密度在北半球的分布和变化。
Reasonable matching of wafer and wire: the advanced matching of wafer improves average voltage in electric field and current density of wafer corona, which the dedusting efficiency is higher.
板线匹配更合理。先进的板匹配，有效地提高了电场平均电压和板电晕电流密度，收尘效率更高。
Operating current density is too high.
操作电流密度过高。
The change of the current density of the upper and lower specification limits by plating solution is the nature of concentration, temperature and stirring, factors such as the decision.
电流密度的变化的上限和下限是由电镀液的本性﹐浓度﹐温度和搅拌等因素决定的。
Operating current density is too low, leading to low current area, coating can't exhalation.
操作电流密度太低，导致低电流区，镀层无法析出。
降低电流密度。
The results show that CO2 transfer rate increases with increasing electrical current density and CO2 concentration difference across the membrane.
解的结果表明： 影响CO2传质通量的因素主要有电流密度及CO2在膜两侧的浓度差。
Current density has great effect on the surface morphology.
电流密度对铸层表面形态有较大的影响。
Doubling hf-current results in a doubling of current density and a fourfold heat provided that the area of effective contact between the tissue ang the electrode remains constant.
如果人体组织和电极之间的有效接触面积保持不变，那么高频电流强度扩大一倍将会使电流密度增大一倍，并产生四倍的热量。
The influence of anode current density, polishing temperature, polishing time and stirring modes on polishing quality was discussed.
探讨了阳极电流密度、抛光温度、抛光时间和搅拌方式对抛光质量的影响。
There is no current flowing through any node(or antinode. ), but the current density changes periodically with time at other places.
没有能流通过节点（或腹点），但在其他各点，能流密度随时间作周期性变化。
Model indicates that, at low current density and high methanol concentration, the methanol crossover poses a serious problem for a DMFC.
模型计算显示，在低电流密度和高浓度甲醇进料情况下，甲醇渗透将成为DMFC的一个严重问题。
Analyzing the effects of current density and additives on tool-electrode wear.
对比分析了电流密度、添加剂对工具电极损耗的影响。
The quality of film is affected by many factors among which current density is the most important one.
其镀层质量受诸多因素的影响，其中电流密度是影响镀层质量重要因素之一。
To meet the needs of high electron current density photocathodes, the processes for preparing cesium antimonide have been studied.
为满足大电流密度电子发射的需要，对锑铯光电阴极的制备工艺进行了研究。
The aggressiveness ofaerated solution accreted by increasing the limit diffusion current density of oxygen.
介质充气后氧的极限扩散电流密度增大，对材料的侵蚀性增强。
The relationships of current density with deposition rate, crystal size and hardness of deposit were studied.
研究了电流密度与沉积速度、晶粒尺寸及镀层硬度的关系。
The effects of pulse peak current density on the texture and hardness of electrodeposited Ni were investigated.
考察了脉冲峰值电流密度对纳米晶镍镀层织构和硬度的影响。
The effects of pulse peak current density on the texture and hardness of electrodeposited Ni were investigated.
考察了脉冲峰值电流密度对纳米晶镍镀层织构和硬度的影响。
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