The eutectic growth of cast iron during rapid solidification has been studied with laser remelting and deep etching.
采用激光快速熔凝和深腐蚀技术，对快速凝固过程中铸铁的共晶生长进行了研究。
A tunneling accelerometer is fabricated and characterized based on the extension of the silicon-glass anodic-bonding and deep etching releasing process provided by Peking University.
提出了一种基于北京大学硅玻璃键合深刻蚀释放工艺的扩展工艺，用来加工微型隧道加速度计。
Available for Electro Chemical Marking and Deep-Etching operations.
可用于电化标示和电深蚀刻操作。
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
The device USES a deep etching with a shallow etching to shield the "static mirror" effect.
该器件采用一次深刻蚀与一次浅刻蚀，从而屏蔽掉“静态镜面”的影响。
Making method of high deep-width rate, batch production of planar windings with LIGA process and silicon deep etching process is researched .
较深入地研究了以LIGA工艺、硅深刻蚀工艺为主的平面绕阻的高深宽比、批量化制作方法。
That means the etching systems have to be capable of creating extremely deep and narrow trenches in silicon, at the nanometer scale, with immense precision.
因为这意味着蚀刻系统必须能以纳米刻度，以超高精度在芯片上刻下极深、极窄的沟槽。
The invention also discloses a chemical etching agent matched with the compound to take deep etch to glass, silicon water and metal material.
本发明还公布了与光成像组合物配合使用，对玻璃，硅晶片、金属基材等进行深度刻蚀的化学刻蚀剂。
The stationary potential deep-etching method is most available than other method to prepare for metallograph analyses on SEM.
恒电位深腐蚀法是目前已知的制备扫描电镜用试样的最有效的方法。
A new method to fabricate continuous deep relief microstructure with enzyme-etching silver halide gelatin is proposed.
提出酶蚀卤化银明胶制作连续深浮雕微结构的新方法。
The consequences are benefit to Silicon electrochemical micromachining technology and the technology will be hopeful to become an new technology about Silicon deep-holes etching technology.
其结果对进一步开展这方面的研究工作具有指导意义，在进一步深入开展研究电化学体硅微加工技术时，可有望成为实现硅深孔列阵加工的新技术。
The consequences are benefit to Silicon electrochemical micromachining technology and the technology will be hopeful to become an new technology about Silicon deep-holes etching technology.
其结果对进一步开展这方面的研究工作具有指导意义，在进一步深入开展研究电化学体硅微加工技术时，可有望成为实现硅深孔列阵加工的新技术。
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