Therefore, such factors having effect on the precision of deep UV lithography as diffraction effect, exposure dosage, wavelength and distribution of fly's eyes lens etc.
同时由于紫外光的衍射效应，获得高精度的大高宽比结构并不容易。本文深入研究了影响紫外深度光刻图形转移精度的如下因素；
Therefore, such factors having effect on the precision of deep UV lithography as diffraction effect, exposure dosage, wavelength and distribution of fly's eyes lens etc.
同时由于紫外光的衍射效应，获得高精度的大高宽比结构并不容易。本文深入研究了影响紫外深度光刻图形转移精度的如下因素；
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