I plant mainly in metal etching process.
我厂主要以金属蚀刻加工。
Hotel stainless steel plate production, mainly to complete the etching process.
不锈钢板酒店标牌的制作，主要采用蚀刻的工艺来完成。
Good surface appearance after EDM process which the etching process can be replaced.
经处理后的表面非常良好，可取代蚀花加工。
The resolution of an etching process is a measure of the fidelity of pattern transfer.
刻蚀工艺的分辨率是图形转移保真度的量度。
The resolution of an etching process is a measure of the fidelity of pattern transfer .
刻蚀工艺的分辨率是图形转移保真度的量度。
The sacrificial layer is removed through an etching process such as chemical mechanical planarization.
该牺牲层是通过例如化学机械平面化的蚀刻工艺除去的。
This paper designs an etching system with constant temperature for etching process in MEMS manufacture.
本文设计了一个恒温腐蚀系统，用于微机械加工制作中的腐蚀工艺。
Research in my paper is mainly concentrated on etching process of cavity and fabrication of the molybdenum tips.
论文主要围绕空腔刻蚀工艺和尖锥沉积工艺两部分进行了重点研究。
Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.
还可针对特定蚀刻工艺将所述蚀刻剂或所蚀刻的层中的任一者或两者优化。
The efficiency of the etching process may be increased in various ways, and the cost of an etching process may be decreased.
可以各种方式来增加蚀刻工艺的效率，且可降低蚀刻工艺的成本。
The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them.
薄膜先以微影及蚀刻制程制作出金属线路，线路之间则填入二氧化矽。
It is found that etching rate decreases with increasing incident fluences, so the influence of plume in the etching process is studied.
针对刻蚀率随入射能量增加而下降的问题，详细研究了刻蚀羽辉在刻蚀过程中的影响；
Making method of high deep-width rate, batch production of planar windings with LIGA process and silicon deep etching process is researched .
较深入地研究了以LIGA工艺、硅深刻蚀工艺为主的平面绕阻的高深宽比、批量化制作方法。
After each stage of the etching process a fixed depth of this is dissolved away, exposing a different part of the circuit to the etching chemicals.
在蚀刻技术的每个阶段，固定高度的阻材料层会消失，暴露出不同部分的电路进行化学物质的侵蚀。
The invention reduces the threat of generating defects on a semiconductor device in the subsequent etching process and improves the quality of the semiconductor device.
本发明减小了后续刻蚀过程中在半导体器件上产生缺陷的威胁，提高了半导体器件的质量。
The present invention relates to combined dry and wet etching process for multilayer film, especially in anisotropic magnetic resistance effect (AMR) sensor manufacture.
本发明涉及多层膜的蚀刻方法，特别是各向异性磁电阻效应(amr)传感器制造中所使用的多层膜的蚀刻方法。
Aquatint: it is an etching process on copper or steel by means of nitric acid. in this technique a thin layer of resin dust is sprinkled on the plate and heated to make it adhere.
水彩色调：用硝酸在钢片或铜片上作腐蚀的蚀刻法。这个技巧是在版面上洒上一层薄薄的树脂粉，加热把它粘附于版面。
Because the etched pattern will be effected by many factors, many technical difficulties such as getting the ideal etched pattern and monitoring the etching process have not been solved yet.
因影响半导体激光诱导液相腐蚀效果的因素很多，要得到理想的腐蚀图样以及监控腐蚀进程有着很大的技术难度，至今没有得到有效解决。
The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another.
传感器的该导电引线和分路结构可以以公共光刻掩模化和蚀刻工艺形成从而它们彼此自对准。
Application of TMAH solutions which is used as etchant in boron etch-stop and anisotropic etching process in the manufacturing of single-crystal and polysilicon pressure sensors is mainly discussed.
介绍了四甲基氢氧化铵(TMAH)溶液的腐蚀特性，论述了在单晶硅和多晶硅高温压力传感器的制作过程中，TMAH腐蚀液在浓硼终止腐蚀和各向异性硅杯腐蚀两个制作工艺中的应用。
Based on application of theories of complexing and precipitation equilibriums and study of etching process using acidic copper chloride etching soln. , a new method of recovering Cu in etching soln.
运用络合平衡和沉淀平衡的理论，对酸性氯化铜蚀刻液的蚀刻过程进行研究，提出以铜废料作还原剂，回收蚀刻液中铜。
How good sign production process, test swing carved this etching machine precision variable speed conveyor belt can, scouring the length of time can be adjusted here.
酒店标牌制作的工艺如何好，试刻这台精密摇摆蚀刻机传送带可以无级调速，冲刷时间的长短可以在这里进行调整。
Copper Etching is an important step in the PCB production process.
蚀铜过程是生产线路板的一个关键步骤。
Dry etching technique of silicon is a very important process in the modern semiconductor industry.
对硅的干法刻蚀技术是现代半导体工业中非常重要的一项工艺。
The technology process and mechanism of etching are also discussed in detail with examples of hollowing board process.
结合镂空板工艺实例，详细介绍了工艺过程，并讨论了取得的效果与蚀刻机理。
The design of structure was put forward from the theory of electrostatic actuating and some aspect associated with the process such as etching and bonding were discussed in details.
从静电驱动的角度阐述此种反射镜的结构设计原理，并对具体加工中的腐蚀和键合工艺进行了详细讨论。
The evolution rule of the rare earth aluminum capacitor foil preparation process was investigated by means of bit etching, EBSD micro orientation analysis and X-ray method.
采用蚀坑法、EBSD微取向分析和X射线法等手段，对稀土电解电容器用铝箔制备过程中的织构演变规律进行了研究。
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
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