Film preparation conditions, film surface morphology and structure of the two kinds of materials are summarized.
总结了这两类材料的成膜条件、薄膜表面形态和结构以及它们的敏感特性。
The results show that the film surface morphology is reticular porous structure, at different time and termination voltage, there is large difference between membrane surface structure;
结果表明：膜层表面微观形貌呈网状多孔结构，不同时间和终止电压下，膜表层结构区别较大；
In argon (ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied.
采用脉冲激光烧蚀技术在氩气环境下制备了纳米硅薄膜，研究了环境气体压强对纳米硅薄膜表面形貌的影响。
Scanning electron microscope (SEM) and X-ray diffraction (XRD) were used to measure the surface morphology, the crystal microstructure and the distribution of diamond grain in the film.
用扫描电镜(sem)和X射线衍射(XRD)方法检测了复合膜的表面形貌、晶体显微结构和复合膜中金刚石颗粒的分布情况。
The effects of anodic oxidation process on thickness, corrosion resistance and surface morphology of hard oxidation film were studied.
为了研究阳极氧化工艺条件对硬质氧化膜的厚度、耐蚀性、表面形貌的影响。
The structures and surface morphology of coating and oxide film were characterized using X-ray diffraction and scanning electron microscopy.
利用X射线衍射和扫描电镜研究涂层和氧化物膜的结构和表面微观形貌。
The surface morphology and composition of the conversion film are observed and analyzed respectively by EPMA .
利用电子探针测定转化膜的表面形貌及化学成分。
The surface morphology and chemical structure of the film are characterized by Atomic Force Microscope (AFM) and Fourier Transform Infrared Spectroscope (FTIR).
并且分别利用原子力显微镜和傅立叶变换红外光谱对薄膜进行界面形态和微观结构分析。
The SEM morphology of the sealed coatings confirmed that there was a protective film on the surface of the Ni-P alloy coatings, which effectively sealed the pores of the coatings.
通过扫描电镜观察了封孔处理后镍磷合金镀层的表面形貌，可见：经封孔处理后的镍磷合金镀层表面形成了一层保护膜，使镍磷合金镀层的孔隙得以封闭。
SEM and AFM studies show that surface of the C60 film is very flat, arrangement of crystalline grain is even, morphology of C60 crystal is sharp.
薄膜的SEM和AFM观测表明样品表面光滑，且呈现出形态完整、分布均匀的晶粒。
The effects of the flow rate of oxygen and pulse bias voltage on the structure, deposition rate and the surface morphology of thin film were studied.
研究了氧流量和脉冲偏压对薄膜相结构、沉积速率、表面形貌、薄膜硬度的影响。
The structure, morphology, the element composition and its distribution on the surface of the composite film were then analyzed by means of XRD, om, SEM EDS and XPS.
利用XRD、OM、SEM、EDS和XPS分析了该复合薄膜的结构、表面形貌及表面元素的组成和分布，并通过紫外光照下甲基橙溶液的光催化降解反应分析了薄膜的光催化活性。
The morphology and microstructure were described via DTA-TG , XRD, SEM. Surface of the thin film was uniform and dense.
通过DTA-TG、XRD、SEM 对薄膜的结构和形貌进行了表征，结果表明：抗静电复合薄膜表面均匀致密。
The surface morphology and the component of the film has been analyzed by scanning electron microscopy (SEM) and X-ray photoelectron spectrometer (XPS).
并利用扫描电子显微镜(sem)和x -射线光电子谱(XPS)对薄膜的形貌和组分进行了表征。
The surface morphology and the component of the film has been analyzed by scanning electron microscopy (SEM) and X-ray photoelectron spectrometer (XPS).
并利用扫描电子显微镜(sem)和x -射线光电子谱(XPS)对薄膜的形貌和组分进行了表征。
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