ZHOU S, YAN Y X. Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition[J]. Vacuum, 2005,42(2):15-18.
[12] 周顺，严一心。脉冲真空电弧离子镀在不锈钢上沉积类金刚石薄膜的研究[J]。真空，2005，42（2）：15-18。
Power in ion deposition arc evaporating unit, type ZXG is specially used for the arc evaporation of multi-arc ion coating equipment.
ZX G型离子沉积电弧蒸发电源装置，专门用于多弧离子镀膜机的电弧蒸发。
PVD coatings involve atom-by-atom, molecule-by-molecule, or ion deposition of various materials on solid substrates in vacuum systems.
物理蒸发沉淀涂层涉及到在真空装置内各种各样的材料原子紧靠原子、分子紧靠分子或离子沉淀于固态基体上。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
The results show that the dynamic hybrid ion implantation deposition technology has remarkable results for improving the performance of combination between film and silicon substrate.
对比分析结果表明，动态混合离子注入沉积工艺对提高膜层与基体的结合性能效果显著。
Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.
涂层的化学气相沉积(CVD)和表面层改性的物理气相沉积(PVD)涂层的离子注入，所有三个正在受到考验，并部分使用。
Various metal or metal the material composing a target is collide with by electrified ion is brought about the metal atom becoming the free particle deposition surface in mylar above.
各种金属或金属合成靶材被带电离子撞击，造成金属原子成为自由粒子沉积在上面的聚酯薄膜的表面。
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.
衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
There are various methods to obtain antibacterial surface on stainless steels, such as chemical heat treatment, magnetron sputtering, ion implantation, Sol-Gel, and chemical deposition.
制备表面抗菌不锈钢的方法有化学热处理、磁控溅射、离子注入、溶胶-凝胶和化学沉积。
Objective: To study the effect of TiN film obtained by ion beam assisted deposition (IBAD) technology on magnetic force of FeCrMo soft magnetic alloy.
目的：研究应用离子束辅助沉积制备氮化钛薄膜后，对磁性附着体磁力的影响。
Titanium nitride(TiN) hard protective films were fabricated on AISI52100 bearing steel surface employing plasma immersion ion implantation and deposition(PIIID) technique.
用等离子体浸没离子注入与沉积（PIIID）复合强化新技术在AISI52100轴承钢基体表面成功合成了硬而耐磨的氮化钛薄膜。
The research indicates that the deposition rates of the alloy and silver are controlled by the diffusion of ammine silver complex ion in the bath.
研究证明钯银合金和银的沉积速率受控于银氨给离子的传质过程。
Ion-enhanced physical vapor deposition is utilized to deposit repair material on ti alloy turbine parts.
离子增强物理气相沉积是利用沉积在钛合金涡轮部件修复材料。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
However, the predominant process of secondary ion sputtering is kinetic sputtering, which closely related to the momentum deposition on the target surface (nuclear stopping power).
而主导二次离子溅射的过程是动能溅射，它与靶表面的动量沉积(核能损)过程密切相关。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
The hydrogen and boron ion bombardments were performed by applying a negative bias voltage to the substrate during microwave plasma chemical vapor deposition process.
在微波等离子体化学气相沉积金刚石膜时，采用负偏压使氢和硼离子轰击金刚石膜表面。
Process review shows that the substrate material is the key factor for the carbon films deposition, and the parameters of ion energy, pressure and methane ratio are impotent also.
工艺研究结果表明，衬底材料对制备该新型纳米碳膜具有关键作用，离子能量、工作压力及气氛等工艺因素也具有重要作用。
Phosphine (PH3) is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping, ion implement and chemical vapor deposition (CVD) etc.
磷化氢(PH3)是一种重要的电子特气，主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
Prom ion cleaning, ion-assisted deposition and ion post treatment, the application background, merits and the problems of ion assisted technology for high power laser films are introduced.
从离子束清洗、离子束辅助沉积以及离子束后处理三个方面，介绍了离子束辅助技术在高功率激光薄膜中的应用背景、应用优势以及存在的问题。
And coating materials of laser film, coating design, deposition techniques and ion assisted deposition parameters were researched in-depth.
并对激光膜的镀膜材料、膜系设计、沉积工艺及离子辅助沉积参数等进行了深入研究。
DLC films and gradient composition DLC films were deposited on si substrates in plasma-ion beam enhanced deposition system for the industrial applications and improving the adhesion.
本文基于产业化应用和改善类金刚石膜与基体结合力为目的，在大型工业用等离子体—离子束增强沉积系统中，获得了DLC膜和梯度复合dlc膜。
Low voltage high current reactive ion plating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
In vacuum deposition, using of the cold cathode ion source can reduce the deposition period.
论述了冷阴极离子源及其在真空镀膜中的应用。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
应用推荐