ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.
磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
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