Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.
用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
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