The main techniques used to decrease static power are:reduce current from substrate and mosfet gate.
减少静态功耗的主要技术是降低衬底电流和栅电流等。
The MOSFET gate currents of high k gate dielectrics due to direct tunneling are investigated by using a new direct tunneling current model developed.
提出了包括有限势垒高度下反型层量子化效应以及多晶硅耗尽效应在内的直接隧穿电流模型。
The MOSFET input diode is controlled by an electric field in the gate region, thus the input impedance is always extremely high because there is no forward biased diode to lower the input impedance.
MOSFET的输入二极管是由一个电场控制在门区，因此总是输入阻抗非常高，因为没有正向偏置二极管，以降低输入阻抗。
Various MOSFET tests require making low current measurements. Some of these tests include gate leakage, leakage current vs. temperature, substrate to-drain leakage, and sub-threshold current.
各种MOSFET测试都要求进行弱电流的测量。这些测试包括栅极漏电、泄漏电流与温度的关系、衬底对漏极的漏电和亚阈区电流等。
The structure of a vertical multiple-gate MOSFET based on bipolar technology is presented.
提出了一种基于双极工艺的纵向多面栅MOSFET的结构和工艺。
Its dual UVLO feature protects the power MOSFET from damage in the event that the gate-drive or supply voltage is too low.
器件的双uvlo功能保护功率MOSFET不会因栅极驱动或电源电压过低而损坏。
But the fabrication of self aligned double gate MOSFET is too complicated.
但是目前自对准的双栅MOSFET的工艺制作相当困难。
The processes of the bootstrapping from source and drain are analyzed in detail based on the capacitor model of MOSFET and it is pointed out that the gate capacitance mainly plays a part of coupling.
本文从MOS管电容模型出发详细分析了MOS源漏自举电路的自举物理过程，认为其中负载管栅电容主要起耦合作用。
The new research of MOSFET-gate dielectric was summarized.
本文综述了MOSFET栅介质的最新研究状况。
In this paper, the switching process of power MOSFET is introduced based on its gate-charge characteristics.
本文先介绍了基于功率MOSFET的栅极电荷特性的开关过程；
Firstly, an analysis of the structure of various SOI MOSFET and their characteristics under conditions of different front and back gate-voltage are made.
论文分析了SOIMOSFET器件的结构及不同前、背栅压的条件下薄膜双栅SOI MOSFET的器件特性；
The high frequency parasitic effect of MOSFET is emphasis on, included gate resistance, substrate resistance, and parasitic capacitance.
重点讨论MOSFET的高频寄生参数，包括栅电阻、衬底电阻、寄生电容等。
A detailed principle and a rigorous analysis of a new noise, the gate-induced noise, in pixel MOSFET of CMOS imagers are provided.
采用系统研究方法来分析包括MOS器件的沟道噪声和感应栅噪声在内的CMOS低噪声放大器中的噪声，并提出了一个新的噪声系数解析式。
A detailed principle and a rigorous analysis of a new noise, the gate-induced noise, in pixel MOSFET of CMOS imagers are provided.
采用系统研究方法来分析包括MOS器件的沟道噪声和感应栅噪声在内的CMOS低噪声放大器中的噪声，并提出了一个新的噪声系数解析式。
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