This paper mainly deals with the relationship between negative bias of substrate and component phases of magnetron-sputtering ion plated aluminium film of A3 steel.
本文主要论述基板负偏压与A 3钢基体磁控溅射离子镀铝膜相组成的关系。
Ions sputtering could lead to the decrease of the thickness when the substrate negative bias voltage increases excessively.
负偏压过大对吸附离子产生反溅射作用导致涂层厚度减小。
Ions sputtering could lead to the decrease of the thickness when the substrate negative bias voltage increases excessively.
负偏压过大对吸附离子产生反溅射作用导致涂层厚度减小。
应用推荐