Why not use photolithography to make nano structures?
为什么不使用光蚀刻法制造奈米结构？
Spherical aberration can damage image quality in photolithography.
球面像差能破坏光刻的成像质量。
First, consider the advantages and disadvantages of photolithography.
首先，想想光蚀刻法的优点跟缺点。
The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.
采用紫外光刻法制得图案化的阳极氧化铝模板。
The photo-induced etching effect, or development-free vapor photolithography is a very interesting phenomenon.
光致诱蚀作用或无显影气相光刻作用是一个非常有趣的现象。
The business unit's capabilities including photolithography, micro-etch and small scale thermal dissipation technology.
该业务部门的技术能力包括照相平版印刷、微蚀刻和小规模散热技术。
The prototype of the micro actuator is fabricated by means of micro electroforming and SU-8 photolithography techniques.
利用SU-8光刻胶制备电铸模和微电铸工艺，制造了二维微执行器原型。
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
From an industrial standpoint, manufacturers of microchip devices use these deep excimer lasers for high-resolution photolithography.
从工业角度来看，微芯片设备制造商使用这些深准分子激光器用于高分辨率光刻。
Firstly the poly(dimethylsiloxane) (PDMS) elastomeric stamp used in soft lithography was fabricated by the photolithography technique.
本文还用微印刷技术证实了聚电解质多层膜的可压缩性。
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.
规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。
In this paper, the principle, construction and function of a new near photolithography system for manufacturing circular gratings are introduced.
本文介绍制造回光栅所采用的一种新型接近式光刻系统的原理、结构和光刻性能。
There, he and his colleagues devised a scheme to marry photolithography, a technology used in semiconductor fabrication, to combinatorial chemistry.
正是在那，他与他的研究人员一起将用于半导纤维的技术-影像平面印刷技术与组合化学嫁接到了一起。
Photolithography combined with etching technique is the most commonly used technique for fabrication of silicon, glass and quartz microfluidic chips.
光刻和蚀刻技术常用于加工硅、玻璃和石英芯片。
To create intricate patterns of many different types of bacteria, Weibel borrowed a technique from the computer chip industry called photolithography.
为了精细地制造各种不同的细菌排列，Weibel借用了计算机芯片制造中的微影技术。
Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.
课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。
There has been a great interest in such structured films due to its potential applications in photolithography, near field microscopy and photonic devices.
这种结构的金属薄膜在光印刷、近场显微镜和光子器件等方面有着广泛的应用前景，近年来引起了人们的重视。
Evanescent wave fiber-optic sensors (EWFS) with acicular encapsulation were fabricated using silicon photolithography technology and silica wet-etching technology.
用硅光刻工艺和二氧化硅湿法腐蚀工艺制作了针状封装结构的光纤消逝场传感器。
The pixel structure is removed by optimizing the parameters of imaging system rather than other techniques that make the setup of digital photolithography complexity.
提出用优化成像系统设计参量的方法有效消除基于数字微镜阵列的栅格结构及其衍射对微结构成像质量的影响。
The utility model can protect the film from pollution and increases the printing quality of photolithography during the production of semiconductor integrated circuits.
本实用新型可保护薄膜不受污染，提高半导体集成电路生产过程中的照相平版印刷质量。
This paper introduces a fabricated method of using fused silica as the chip material. It includes standard photolithography, wet chemical etching and bonding techniques.
本文介绍了选用优质石英为芯片基体材料的一种制作方法，关键技术包括标准的光刻，湿法腐蚀，键合等微加工技术。
In chapter 3, the process technology of silicon mold by means of photolithography and wet etching was introduced, which is a important process of hot embossing technology.
第三章介绍的是热压工艺中的一个重要工艺环节——硅阳模制作工艺。
The array electrodes were produced by method of photolithography and stripping. and a PDMS-glass microfluidic chip integrating the array of electrodes was bonded efficiently.
采用光刻法和剥离法进行了阵列电极的制作，并成功键合了带有阵列电极的PD MS -玻璃混合微流控芯片。
The copper electrode couple preparation step prepares the copper electrode couples with a plurality of micrometers of relative spacing by a yellow-light photolithography process.
铜电极偶制备步骤，为利用黄光微影制程制作出相对间距为数微米的铜电极 偶。
To make a TFT-LCD panel which has higher performance, fine patterning process of photolithography is needed. Making smaller via pattern is one of main issue for fine patter - ning.
为了获得更高性能的TFT - LCD面板，在光刻时保证精细的图形成像十分重要，其中，如何制作出尺寸更小的通孔图形是主要的问题之一。
In 1991 they published a paper that made the cover of the journal Science, describing how photolithography could be used to direct light to activate the synthesis of biological compounds.
并就此于1991年发表的文章成为《科学》杂志的封面文章阐述了影像平面印刷技术如何能够直接激活生物物质的信息汇总。
In 1991 they published a paper that made the cover of the journal Science, describing how photolithography could be used to direct light to activate the synthesis of biological compounds.
并就此于1991年发表的文章成为《科学》杂志的封面文章阐述了影像平面印刷技术如何能够直接激活生物物质的信息汇总。
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