The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
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