• The RF self-bias of the substrate in an RF inductively coupled plasma is controlled by changing the impedance of an external circuit inserted between the substrate and the ground.

    采用调节射频感性耦合等离子体基片电极之间外部电路阻抗方法,控制基片电极的射频自偏压。

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  • An inductively coupled plasma antenna, which is installed on a center of the dielectric window, transfers radio frequency power from an RF power supply to the interior of the processing chamber.

    感应耦合等离子体触角安装介电窗上以便定位在介电中心上,并且将来自射频电源的射频功率传输加工室内部。

    youdao

  • An inductively coupled plasma antenna, which is installed on a center of the dielectric window, transfers radio frequency power from an RF power supply to the interior of the processing chamber.

    感应耦合等离子体触角安装介电窗上以便定位在介电中心上,并且将来自射频电源的射频功率传输加工室内部。

    youdao

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