An experiment was conducted to study the high-temperature annealing characteristics of polysilicon films using atomic force microscope, secondary ion mass spectroscopy and probe.
利用原子力显微镜、二次离子质谱分析仪和探针，对多晶硅薄膜的高温退火特性进行了实验研究。
Among the destructive techniques able to provide the desired depth resolution the most widely used technique is secondary-ion-mass spectroscopy (SIMS).
在可以提供所希望的纵向分辨率的损伤技术中，最广泛运用的是二次离子质谱(SIMS)。
Among the destructive techniques able to provide the desired depth resolution the most widely used technique is secondary-ion-mass spectroscopy (SIMS).
在可以提供所希望的纵向分辨率的损伤技术中，最广泛运用的是二次离子质谱(SIMS)。
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