Then three kinds of films are acquired: silicon film on the surface of glass, the film on silicon target and transferred film on another silicon substrate.
这样我们得到了三种薄膜:玻璃表面的硅薄膜、硅靶上的薄膜和转移到硅基底上的薄膜。
The insulating layer is positioned on a first surface of the silicon substrate.
该绝缘层位于该硅基材的第一表面。
The solar cell includes N-type crystalline silicon particles (01), aluminum substrate (02), middle insulating layer (05), surface transparent conductive layer (06) and antireflection layer (07).
包括N型体晶硅体颗粒(01),铝衬底 (02),中间绝缘层(05),表面透明导电层(06)和减反射层(07)构成。
The electric element is positioned inside the silicon substrate and is exposed on a second surface of the silicon substrate.
该电性元件位于该硅基材内,且显露于该硅基材的第二表面。
The method is as follows: the surface of a silicon substrate adopts the three-layer metal wiring of metal 1, metal 2 and metal 3;
所述方法是:在硅基板的表面采用金属1、金属2和金属3三层金属布线;
Further increasing the substrate temperature broadens the band tail width of the films because the hydrogen content is too low to passivate the dangling bonds at the NC silicon grain surface.
对应更高的衬底温度,因薄膜中的氢不能完全中止纳米晶粒界面的悬键,使薄膜能带带尾加宽。
In the paper, experiments of surface strengthening process were made with single crystal silicon as electrode material and 45 steel as substrate material in kerosene on EDM forming machine.
以单晶硅作电极,用电火花成形机在煤油介质中对45钢进行表面强化实验研究。
A layer of europium oxide red light luminescent thin film is deposited on one side surface of a single crystal silicon substrate.
在单晶硅衬底的一个侧面沉积有一层氧化铕红光发光薄膜。
The method can selectively deposit an epitaxial silicon-containing film on a silicon surface of a substrate or, alternately, non-selectively deposit a silicon-containing film on a substrate.
该方法可以在衬底的硅表面上选择性地沉积外延含硅膜,或者在衬底上非选择 性地沉积含硅膜。
The invention discloses a forming method for metal silicide, which comprises the following steps of: providing a substrate with the surface having silicon material;
本发明公开了一种金属硅化物的形成方法,包括步骤:提供一表面含硅 材料的衬底;
The invention discloses a forming method for metal silicide, which comprises the following steps of: providing a substrate with the surface having silicon material;
本发明公开了一种金属硅化物的形成方法,包括步骤:提供一表面含硅 材料的衬底;
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