In this article, deep submicron lithography and nano processing are reviewed.
本文综述了深亚微米光刻和纳米光刻技术。
Experimental results of deep submicron lithography with a excimer laser are reported in this paper.
报道用远紫外准分子激光进行亚微米光刻的实验结果。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
在现有国产光刻设备的基础上，研制成功了能够复印出亚微米图形的三层胶工艺，并用于制作亚微米电路。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
在现有国产光刻设备的基础上，研制成功了能够复印出亚微米图形的三层胶工艺，并用于制作亚微米电路。
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