A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
It is described that the innovatory technology of selective diffusion and study on surface passivation in theory for crystalline silicon solar cell.
本文的主要内容是介绍晶体硅太阳电池选择性扩散新工艺和表面钝化的理论研究。
The technology of surface passivation and morphology controlling of porous silicon (PS) exhibits high scientific values for both fundamental and application research.
多孔硅表面钝化和表面形貌的控制技术具有重要的基础和应用研究价值。
The passivation and painting technology can be used to protect and decorate the surface of copper and its alloy products in the outdoor and which need high anti-corrosion performance.
钝化涂装工艺可用于室外及抗腐蚀性能要求较高的铜及其合金制品的表面防护装饰。
The passivation and painting technology can be used to protect and decorate the surface of copper and its alloy products in the outdoor and which need high anti-corrosion performance.
钝化涂装工艺可用于室外及抗腐蚀性能要求较高的铜及其合金制品的表面防护装饰。
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