Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.

利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。

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Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.

利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。

youdao