A new iron film system, deposited on silicone oil surfaces by vapor phase deposition method, has been fabricated and its growth mechanism and band-shaped ordered pattern were studied.
采用气相沉积的方法在硅油表面成功制备了一种新型的铁薄膜系统，并研究了该薄膜的生长机制及其带状有序结构。
To study the reaction mechanism of CVD (chemical vapor deposition) reaction system, quantum chemistry methods are proved highly potential.
量子化学方法在研究化学气相沉积反应体系的反应机理、动力学计算方面有很大的潜力。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
Cracked tungsten tubes prepared by chemical vapor deposition were investigated by ring machine cutting method and X? Ray stress analysis system.
采用切环测量法及X射线应力分析方法对化学气相沉积制备的开裂钨管进行测量与分析。
Cracked tungsten tubes prepared by chemical vapor deposition were investigated by ring machine cutting method and X? Ray stress analysis system.
采用切环测量法及X射线应力分析方法对化学气相沉积制备的开裂钨管进行测量与分析。
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