A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
设计了一种网状阴极溅射靶，它是由多个空心阴极并列交叉组合而成。
It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate.
它具有工作气压高，维持电压低，阴极溅射率高等特点。
A new multiple hollow cathode sputtering target which has a simple structure and a high sputtering rate, was put forward.
研制了一种由多个空心阴极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
毫克每显示的直流等离子显示器中阴极溅射抑制剂中的汞含量。
The surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.
本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的净化作用。
Plasma Nitriding Plasma can accelerate the reactions by increasing the energy of nitrogen ions and additionally activating them as a result of cathode sputtering.
血浆氮化物血浆能借由增加能源加速反响氮离子而且此外启动他们结果阴极溅散。
A discharge model on the sputtering hollow cathode discharge (SHCD) copper ion laser is established, its characteristics of discharge, sputtering and the particle interaction processes are analysed.
本文祥细分析了溅射型空心阴极放电(SHCD)铜离子激光器的放电、溅射特性和粒子的相互作用过程，建立了放电模型。
Reducing reflecting layer, transparent electrode, emitter and cathode in the LCD manufacturing technology are all carried out using sputtering method.
液晶显示器制造工艺中的降低反射层、透明电极、发射极与阴极等均由溅射方法形成。
The electronic circuitry of the various vacuum protection schemes, which use sputtering ion pump or cold-cathode or hot cathode ionization gauge as sensors, was compared.
分析比较了溅射离子泵、冷阴极电离超高真空计、热阴极电离超高真空计等作为真空保护传感器的不同电子学设计。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
While hollow cathode being discharged, migration, diffusion, evaporation and sputtering of reaction products were analyzed.
论述了空心阴极放电时，其内部化学反应生成物的迁移、扩散、蒸发和溅射。
The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.
真空室内的气体等离子体可由热灯丝或射频放电产生，4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
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