Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
此外,栅格大小与制造设计掩模的最小化电子束点大小成比例。
Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
此外,栅格大小与制造设计掩模的最小化电子束点大小成比例。
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