This effect is very significant at low substrate temperature or high deposition rate.
而且能量的影响在较低的基片温度或是较高的沉积速率时更加显著。
High ionization rate, full reaction, pure film color, fast deposition.
离化率高，膜层反应充分，使膜层颜色纯正，沉积速度快。
The growth rate, film morphology, and microstructure are not sensitive to the deposition pressure.
而工作气压对生长速率、薄膜形貌和微观结构的影响不明显。
The growth rate, film morphology, and microstructure are not sensitive to the deposition pressure.
而工作气压对生长速率、薄膜形貌和微观结构的影响不明显。
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