Etching time has been extended in wet etching course.
在湿法刻蚀诱导坑时，需适当延长刻蚀时间。
The mask design and the wet etching are both key processes in the technology introduced.
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
The mask design and the wet etching are both key processes in the technology introduced.
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
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