• A method of manufacturing a metal oxide semiconductor (500).

    一种制造金属氧化物半导体方法(500)。

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  • A gate structure of the metal oxide semiconductor is etched (510).

    金属氧化物半导体栅极构造蚀刻(510)。

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  • High mobility P-channel power metal oxide semiconductor field effect transistors.

    迁移率的P -沟道功率金属氧化物半导体效应晶体管

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  • The oxygen-sensitive characters of metal-oxide semiconductor oxygen sensor is re-ported.

    研究氧化物半导体敏元件的氧敏特性

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  • The oxygen - sensitive characters of metal - oxide semiconductor oxygensensor is re - ported.

    研究了一氧化物半导体元件特性

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  • Alternatively, it is another object to provide a semiconductor device using the oxide semiconductor.

    或者,本发明的另一个目的在于提供使用氧化物半导体的半导体装置

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  • The dependence of grain boundary on conductivity in NTC polycrystalline oxide semiconductor was discussed.

    主要讨论NTC多晶氧化物半导体晶界电导影响。

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  • Provided is a complementary metal oxide semiconductor (CMOS) device and a method of manufacturing the same.

    本发明提供了一种互补金属氧化物半导体CMOS装置及其制造方法

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  • They studied the pressure dependence of electrical properties of metal-oxide semiconductor in a separate paper.

    他们篇文章中给出关于金属氧化物半导体电学特性压强依赖关系研究结果。

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  • ZnO nanoparticle is an important oxide semiconductor material, which is of potential applications in many areas.

    纳米氧化锌颗粒重要氧化物半导体材料具有广泛应用范围

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  • Abstract: Phthalocyanine and oxide semiconductor sensitive materials used for NO2 sensors in recent ten year are described.

    文摘描述了用作NO2气体传感器酞菁类氧化物半导体敏感材料

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  • As so far, there are tow kinds of image sensors: Charge Couple Device (CCD) and Complementary Metal Oxide Semiconductor (CMOS).

    作为到目前为止拖曳种类图象传感器充电夫妇设备(CCD)互补金属氧化物半导体(CMOS)。

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  • The metal oxide semiconductor field effect transistor (MOSFET) works on a similar principle, but the diode is buried within the MOSFET.

    金属氧化物半导体效应晶体管(MOSFET)的作品一个类似的原则二极管MOSFET掩埋

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  • The present invention provides a thin film transistor in which aluminum atoms are unlikely to be diffused to an oxide semiconductor layer.

    发明提供了一种其中原子可能扩散氧化物半导体层的薄膜晶体管

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  • The present invention brings forward a method for determining leakage currents in integrated circuit and metal oxide semiconductor element.

    发明提出一种集成电路金属氧化物半导体元件判断电流方法

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  • Therefore, a higher concentration of hydrogen is introduced into the oxide semiconductor layer 905 than into the oxide semiconductor layer 906.

    因此氧化物半导体(905)引入氧化物半导体层(906)更高浓度

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  • The invention can improve the micro-loading effect while etching the grooves in the process manufacturing the stress metal oxide semiconductor device.

    发明改善应变金属氧化物半导体器件制造刻蚀沟槽的微负载效应

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  • A semiconductor device which includes a thin film transistor having an oxide semiconductor layer and excellent electrical characteristics is provided.

    提供了一种包括薄膜晶体管半导体器件薄膜晶体管具有氧化物半导体优秀的特性

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  • A complementary metal oxide semiconductor (CMOS) readout integrated circuit (ROIC) for the sensitive material of vanadium dioxide (VO_2) was introduced.

    介绍一种针对二氧化敏感材料CMOS读出电路(RO IC)。

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  • Oxide semiconductor ceramics are new thermoelectric materials used at mid_or high_temperature for potential application in power generation from waste heat.

    氧化物半导体陶瓷材料新型的中、高温热电材料。

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  • The electronic device is provided with a semiconductor layer composed of an oxide semiconductor material and an electrode arranged on the semiconductor layer.

    电子装置具有包含氧化物半导体材料半导体,和设置上述半导体层上的电极

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  • Provided are an oxide semiconductor material, a method for manufacturing such oxide semiconductor material, an electronic device and a field effect transistor.

    本发明提供氧化物半导体材料和其制造方法电子装置效应晶体管

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  • Therefore, the metal oxide semiconductor can be used efficiently without additional manufacturing of a capacitor, and can save the chip size so as to reduce the cost.

    如此有效率地利用金属氧化物半导体无须另外制作电容,可节省芯片尺寸大小进而降低 成本。

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  • According to the present invention, formation of lattice defect in an oxide semiconductor layer and entering of moisture can be prevented, improving reliability of the thin film transistor.

    发明能够抑制氧化物半导体晶格缺陷形成抑制湿气进入从而提高薄膜晶体管可靠性

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  • The invention disclosed a metal oxide semiconductor element with voltage stabilization and electrostatic discharge protection and a manufacturing method thereof, which is applied to a chip.

    发明公开了稳压静电放电防护金属氧化物半导体元件及其制造方法应用于一芯片。

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  • A semiconductor device including a thin film transistor which includes an oxide semiconductor layer and has high electric characteristics and reliability is provided in the present invention.

    发明的目的之一在于使用氧化物半导体提供具备特性可靠性优异的薄膜晶体管的半导体装置

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  • The invention belongs to the field of oxide semiconductor film materials, and in particular relates to a zinc oxide and titanium dioxide composite film material and a preparation method thereof.

    发明属于氧化物半导体薄膜材料领域特别涉及氧化锌二氧化钛复合薄膜材料及其制备方法。

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  • The invention relates to a power supply structure of a memory, which comprises a charge pump, a readout voltage regulator, a decoupling capacitor and an MOS (Metal Oxide Semiconductor) transistor;

    发明存储器供电结构包括电荷读出电压调节器一个去耦电容MOS晶体管;

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  • At the same time, gas sensitive characteristic of semiconductor oxide was summarized for the normal temperature and some issue should to be solved, which. Was pointed out also.

    同时,对半导体氧化物气体敏感材料常温气体敏感特性进行归纳总结,指出优缺点需要解决问题

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  • At the same time, gas sensitive characteristic of semiconductor oxide was summarized for the normal temperature and some issue should to be solved, which. Was pointed out also.

    同时,对半导体氧化物气体敏感材料常温气体敏感特性进行归纳总结,指出优缺点需要解决问题

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