• The authors improved the routine steady-state surface photovoltage method to measure minority carrier diffusion length in both sides polished silicon wafers.

    本文改进常规表面光电压测试少子扩散长度,采用环形下电极消除了薄样品背面光电压信号测量结果的影响;

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  • Copper nanocrystallites were deposited on mechanically polished single crystal silicon (sc-Si) wafers by electroless deposition method.

    采用无电镀沉积技术经过机械抛光单晶硅衬底上沉积了纳米

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  • This article mainly introduces the technique of having both sides of silicon wafers polished simultaneously on the polishing machine made domestically.

    本文主要介绍国产双面抛光上一次同时完成硅片双面抛光技术

    youdao

  • This article mainly introduces the technique of having both sides of silicon wafers polished simultaneously on the polishing machine made domestically.

    本文主要介绍国产双面抛光上一次同时完成硅片双面抛光技术

    youdao

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