Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
Silicon nano-wires (SiNWs) were fabricated on Anodized Aluminum Oxide (AAO) template and silicon chips by the Chemical vapor Deposition (CVD) and thermal evaporation method.
本课题利用化学气相沉积(CVD)和热蒸发法在硅片称底和多孔氧化铝(aao)模板上制备纳米硅线。
The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。
LaF3 single-layer coatings were prepared by thermal boat evaporation at different deposition rates. Some of these films were annealed in vacuum.
用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜，并对部分单层膜进行了真空退火。
LaF3 single-layer coatings were prepared by thermal boat evaporation at different deposition rates. Some of these films were annealed in vacuum.
用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜，并对部分单层膜进行了真空退火。
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