The tungsten oxide films by two methods were characterized by atomic force microscope, double-beam UV-VIS-NIR spectrophotometer and X-diffractometer.
本文分别用原子力显微镜、双束紫外可见分光光度计、X-衍射仪等表征了用以上两种方法制备的三氧化钨薄膜。
The tungsten oxide films by two methods were characterized by atomic force microscope, double-beam UV-VIS-NIR spectrophotometer and X-diffractometer.
本文分别用原子力显微镜、双束紫外可见分光光度计、X-衍射仪等表征了用以上两种方法制备的三氧化钨薄膜。
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