• This paper has Studied anisotropic etching mechanism of St in KOH scution by using collision theory.

    本文应用碰撞理论研究KOH溶液各向异性腐蚀机理

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  • This paper introduces the computer simulation for the anisotropic etching used in micro-machining of sensors.

    本文介绍传感器微机械加工使用各向异性腐蚀计算机模拟

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  • The size of the parallelogram is analyzed and designed according to anisotropic etching properties of silicon.

    依据异性腐蚀特性平行四边形蚀坑尺寸进行了分析设计

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  • Two mutually vertical fibers coupling grooves are fabricated by using anisotropic etching of the(110) silicon in the KOH solution.

    利用(110)硅片KOH溶液中各向异性腐蚀制作出两个互相垂直光纤定位槽。

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  • This blade has an edge as the higher order face of the crystal anisotropic etching and the edge inclines at a sharp angle to the polished face as described above.

    刀片具作为结晶各向异性蚀刻面的刃口刃口相对于上述研磨锐利角度倾斜

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  • When remains the DC power, the decreasing of gas pressure can lead to the increasing of etching rate and the transformation from isotropic etching to anisotropic etching.

    直流功率一定时,工作气压降低导致刻蚀速率增加并且刻蚀各向同性转变为各异性。

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  • During fabrication of the NEMS probes, KOH anisotropic etching technology has been developed for the formation of suitable silicon island with top size within 0.5 to 0.8m.

    器件制造的过程中,采用KOH各向异性腐蚀硅尖技术制造出顶部尺寸在0.5~0.8微米范围内符合要求

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  • Application of TMAH solutions which is used as etchant in boron etch-stop and anisotropic etching process in the manufacturing of single-crystal and polysilicon pressure sensors is mainly discussed.

    介绍四甲基氢氧化铵(TMAH)溶液腐蚀特性,论述单晶硅多晶硅高温压力传感器的制作过程中,TMAH腐蚀液在浓终止腐蚀和各向异性硅杯腐蚀两个制作工艺中的应用

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  • A technique for the fabrication of silicon cone cathode array by using anisotropic and isotropic etching has been reported in this paper.

    详细研究了利用各向异性腐蚀各向同性腐蚀制备阴极阵列工艺

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  • Some new techniques are adopted, for example, technology of dual-face alignmental silicon etching and anisotropic corrosion (micromachine), etc.

    采用双面对准光刻工艺各向异性腐蚀微机械加工制膜片技术

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  • Etching silicon tips in anisotropic KOH solution has the advantages of simple, easy to handle, low cost and homogeneous etching rate of (100) crystal plane on a whole wafer.

    向异性KOH溶液腐蚀具有简单易于实现、成本低廉、(100)晶面腐蚀速率均匀优点

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  • The present invention relates to combined dry and wet etching process for multilayer film, especially in anisotropic magnetic resistance effect (AMR) sensor manufacture.

    发明涉及多层膜的蚀刻方法,特别是向异性电阻效应(amr)传感器制造中所使用的多层膜的蚀刻方法。

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  • A new silicon-based bulk micro-machined amperometric microelectrode biosensor is designed and fabricated with anisotropic silicon wet etching.

    本文提出了一种新型衬底体加工安培型微电极生物传感器

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  • A new silicon-based bulk micro-machined amperometric microelectrode biosensor is designed and fabricated with anisotropic silicon wet etching.

    本文提出了一种新型衬底体加工安培型微电极生物传感器

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