This open-type wet process equipment is used to clean substrates and parts by chemical spraying and soaking.

本设备为开放式清洗机，具有喷淋、浸泡功能，用于半导体工业硅片及零部件的清洗。

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This open-type wet process equipment is used to clean substrates and parts by chemical spraying and soaking.

本设备为开放式清洗机，具有喷淋、浸泡功能，用于半导体工业硅片及零部件的清洗。

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