Therefore, novel models for thick chemically amplified photoresist which fit well characters of SU-8 resist is set up.
因而这篇文章包括了我们在厚的化学放大胶光刻模型方面的努力，这些新的模型适用于SU-8胶。
The invention further provides a chemically amplified positive resist composition comprising the salt represented by the formula (I).
本发明还提供含有由上述式（I） 表示的盐的化学放大型抗蚀剂组合物。
The models are based on usual simulation models for chemically amplified photoresist added with swell model and the model for depth - dependent dissolution rate effect.
这个模型在普通的化学放大胶光刻模拟的基础上，添加了溶胀模型和对显影速率随深度变化效应的模拟。
Imaging experimental results indicate that these trichloromethyl substituted triazines can be applied to lithographic compositions for chemically amplified CTP plate and PS plate.
成像实验表明，所制备的三氯甲基取代的三嗪类化合物可用于化学增幅型热敏CTP版和PS版的成像组成物中。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
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