A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
The copper electrode couple preparation step prepares the copper electrode couples with a plurality of micrometers of relative spacing by a yellow-light photolithography process.
铜电极偶制备步骤，为利用黄光微影制程制作出相对间距为数微米的铜电极 偶。
To make a TFT-LCD panel which has higher performance, fine patterning process of photolithography is needed. Making smaller via pattern is one of main issue for fine patter - ning.
为了获得更高性能的TFT - LCD面板，在光刻时保证精细的图形成像十分重要，其中，如何制作出尺寸更小的通孔图形是主要的问题之一。
In chapter 3, the process technology of silicon mold by means of photolithography and wet etching was introduced, which is a important process of hot embossing technology.
第三章介绍的是热压工艺中的一个重要工艺环节——硅阳模制作工艺。
In chapter 3, the process technology of silicon mold by means of photolithography and wet etching was introduced, which is a important process of hot embossing technology.
第三章介绍的是热压工艺中的一个重要工艺环节——硅阳模制作工艺。
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