金属有机化学气相沉积(MOCVD)是一门制备薄膜材料的关键技术。
Metal Organic Chemical Vapor Deposition (MOCVD) is a key technology in growing thin-films.
MOCVD是金属有机化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.
金属有机化学气相沉积法(MOCVD)是一种先进的涂层制备方法，采用此方法制备的涂层具有质量高、完整性好、厚度易于控制等优点。
(MOCVD) is an advanced preparative technique. Coatings prepared by the method have many strongpoints such as high quality, good completeness and good controllability.
金属有机化学气相沉积法(MOCVD)是一种先进的涂层制备方法，采用此方法制备的涂层具有质量高、完整性好、厚度易于控制等优点。
(MOCVD) is an advanced preparative technique. Coatings prepared by the method have many strongpoints such as high quality, good completeness and good controllability.
应用推荐