本文综述了深亚微米光刻和纳米光刻技术。
In this article, deep submicron lithography and nano processing are reviewed.
报道用远紫外准分子激光进行亚微米光刻的实验结果。
Experimental results of deep submicron lithography with a excimer laser are reported in this paper.
早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
在现有国产光刻设备的基础上，研制成功了能够复印出亚微米图形的三层胶工艺，并用于制作亚微米电路。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
并给出远紫外光刻亚微米级图形的电镜扫描照片结果。
The results of electronic microscope scanning of sub-micrometer patterns by far ultraviolet lithography are given.
声盘、视盘及光盘的亚微米圆弧线一般通过激光刻录机光刻制造。
The sub-micron circular features of Compact Disc, Video Disc and Optical Disc are usually produced by laser cutting machine .
本文从最基本的角度出发，介绍了亚微米分步重复投影光刻机中的一项新的检测技术——基准校正技术。
A new detecting technique-correction technique for datum in submicron DSW is introduced from the basic point of view.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
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