涂层的化学气相沉积(CVD)和表面层改性的物理气相沉积(PVD)涂层的离子注入，所有三个正在受到考验，并部分使用。
Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.
薄膜的制备方法包含很多，主要有化学气相沉积，物理气相沉积和其他一些独特的制备方法。
There are a lot of methods in producing films, including CVD, PVD and some other special methods.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
本文介绍了化学气相沉积，物理气相沉积等表面涂层技术在切削刀具中的应用现状与发展趋势。
This paper introduces the chemical vapor deposition, Physical vapor deposition coating technology in the cutting tools of the status and development trend.
综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed.
利用物理或者化学气相沉积镀膜，增加工件表面强度。
Making use of physical or chemical vapor deposition to accumulate to plate the film mutually and reinforces the surface of work strength.
利用物理或者化学气相沉积镀膜，增加工件表面强度。
Making use of physical or chemical vapor deposition to accumulate to plate the film mutually and reinforces the surface of work strength.
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