• 各种探测比较基础上我们设计了微通道板探测目前用于电子束曝光先进的探测

    On basis of comparison with other types of detectors, we designed microchannel plate detector which is the most advanced detector for EBM up to now.

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  • 为实现电子束曝光机扫描线性畸变校正,设计图形发生成像系统,系统包括硬件软件部分。

    An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.

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  • 满足纳米级电子束曝光系统的要求,设计了高速图形发生

    The high speed Patten Generator is designed for nanometer E-beam lithography system.

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  • 电子束蒸发曝光系统

    Refers to ane-beam evaporator or exposure system.

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  • 电子束蒸发曝光系统

    Refers to ane-beam evaporator or exposure system.

    youdao

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