用优选的离子束辅助沉积工艺参数，沉积出结合强度很高的一些薄膜。
The crystal TiB 2 film of high conjunctive intensity can be deposited on the cathode sphere with the IBAD technology.
本文用离子束辅助沉积(IBAD)方法在碳纳米管薄膜表面制备铜薄膜。
We present the methods of forming textured metallic substrate by RABiTS and IBAD.
目的：研究应用离子束辅助沉积制备氮化钛薄膜后，对磁性附着体磁力的影响。
Objective: To study the effect of TiN film obtained by ion beam assisted deposition (IBAD) technology on magnetic force of FeCrMo soft magnetic alloy.
综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed.
从离子束清洗、离子束辅助沉积以及离子束后处理三个方面，介绍了离子束辅助技术在高功率激光薄膜中的应用背景、应用优势以及存在的问题。
Prom ion cleaning, ion-assisted deposition and ion post treatment, the application background, merits and the problems of ion assisted technology for high power laser films are introduced.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
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