The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
A compact ECR plasma source, the strengths of which are its ultra low electron temperature, its low pressure and its ultra low density, was developed and built for such a simulator.
本文就是为空间电离层环境模拟器研制的扩散型极低气压、低电子温度和极低密度的紧凑型电子回旋共振等离子体源的研制。
This article reviews the basic physics of ECR discharge and experimental research, and describes new applications of ECR plasma in surface processing, plasma coating and ion source.
本文综述了ECR放电的基本物理过程和实验研究概况，介绍了ECR等离子体在表面处理、镀膜和离子源等方面应用的最新结果。
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