...陕西师范大学学报编辑部 射频磁控溅射(Radio frequency-magnetro sputtering, RF-MS)和电子束蒸发(Electron beam evaporation, E-BE)方法制备ZnO薄膜,并对两种方法制备的薄膜在400、450和500℃退火后的微观结构、光学与电学性能..
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...范大学学报编辑部 射频磁控溅射(Radio frequency-magnetro sputtering, RF-MS)和电子束蒸发(Electron beam evaporation, E-BE)方法制备ZnO薄膜,并对两种方法制备的薄膜在400、450和500℃退火后的微观结构、光学与电学性能..
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该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
实验结果和理论分析表明,动态变化的电子束蒸发工艺是制备优质ito透明导电膜的有效方法。
The results demonstrate that dynamic e-beam evaporation technology is an effective method for preparing excellent ITO transparent conducting film.
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