微波电子回旋共振化学气相沉积(MWECRCVD)和热丝化学气相沉积(HWCVD)是制备a-Si：H薄膜的两种重要方法，MWECRCVD产生的等离子体具有能量转化率高、气体分解充分、激发态物种和基团浓度高等优点；HWC...
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...hot filament chemical vapor deposition (HFCVD); diamond films; WC−Co substrates; deposition parameters [gap=25582]关键词：热丝化学气相沉积；金刚石薄膜；WC−Co硬质合金基体；沉积参数 ..
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采用热丝化学气相沉积生长出优异的金刚石薄膜。
High quality diamond thin films were grown by hot-filament chemical vapor deposition.
采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.
在热丝化学气相沉积金刚石系统中，衬底温度是影响金刚石成膜质量的关键因素之一。
In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films.
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