根据平面区域变换的原理，导出电子束曝光机扫描场的畸变校正函数，并给出计算机模拟校正的结果。
A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.
为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
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