... annealing temperature range 退火温度范围 Annealing Temperature And Time 退火温度时间 annealing at elevated temperature 高温退火 ...
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So to shorten annealing temperature and time is a vital issue.
因此，降低退火温度，缩短退火时间是一个急待解决的问题。
In this paper, the effect of annealing temperature and time on the rate of metal-induced lateral crystallization (m ILC) of amorphous silicon are investigated in detail.
详细研究了金属诱导非晶硅横向晶化时间、温度对晶化生长的影响。
Tbe present paper is devoted to describe the effect of the implanted energy, dose, and annealing temperature and time on electrical characteristics of circuit components.
文中着重介绍了注入离子能量、剂量、退火温度及时间对电路元件电学性能的影响。
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