as deposited film 沉积态薄膜
The results showed that the as-deposited films were amorphous TiO2 film.
分析结果表明，室温下沉积得到的薄膜为非晶态。
The as-deposited film shows a dielectric constant as low as 2.0 and has high transparency in the visible light range.
沉积的薄膜介电常数约为2.0，在可见光区薄膜具有良好的透光性。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
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