... electrochemical deposition电化学沉积 chemical deposition化学淀积 sediment deposition沉积物沉降;淤积量 ...
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... vapor deposition 汽相淀,蒸镀... chemical deposition 化学沉积,化学淀积... deposition process 淀积工艺过程...
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构造仿生结构色薄膜有多种方法，包括化学沉积法（Chemical deposition）[15]、电沉积法（Electrical deposition）[16]、旋涂法（Spin coating）[17,18] 和静电自组装法（Electrostatic self-assembly）...
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...附法处理高浓度电镀含锌废水的研究 关键词：化学沉降；沸石；吸附；高浓度含锌废水 [gap=1029]Key words：chemical deposition；zeolite；absorption；zinc—containing wastewater at high concentration ..
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Chemical Deposition Method 化学沉积法
chemical vapor deposition 化学气相沉积 ; 化学蒸镀 ; 化学汽相淀积 ; 化学气相沉积法
Ni-P chemical deposition 化学镀Ni
electroless chemical deposition 无电子化学沉积
electric chemical deposition 电化学沉积
chemical vapour deposition 化学气相沉积法 ; 化学气相沉积 ; 沉积法
chemical deposition ni 化学沉积镍
chemical deposition film 化学沉积膜
liquid chemical deposition 液相化学沉积
In this paper, the influence of chemical deposition Cobalt film alloy subjoining Rare Earth film were investigated to improve deposition technology, structure and properties of Cobalt soft magnetic film alloy.
为改善化学沉积钴基合金的工艺、组织结构和性能，本文进行了稀土元素介入化学沉积钴基软磁薄膜的研究。
参考来源 - 稀土元素介入化学沉积钴基软磁薄膜的研究The maximum infrared radiation rate of tourmaline/Al2O3 composite powder which is produced by chemical deposition is 0.89 when the mix ratio of tourmaline and Al2O3 is 3:1. The infrared radiation rate has been increased by 0.03, compared with lithium tourmaline.
化学沉淀法制备出的电气石/Al2O3复合粉体,当锂电气石与氧化铝以质量比3:1时,红外辐射率最大,为0.89,比复合前锂电气石的红外辐射率提高了0.03,达到了实验预期要求。
参考来源 - 电气石/Al·2,447,543篇论文数据，部分数据来源于NoteExpress
Quick surface metallization of titania powder was carried out by electroless chemical deposition of nickel.
采用镍的无电子化学沉积方法研究了纳米二氧化钛粉末表面的快速金属化。
The biggest difficulty is chemical deposition of copper of PTFE activation pretreatment, is also the most crucial step.
其最大的难点是化学沉铜前的聚四氟乙烯活化前处理，也是最为关键的一步。
Investigation about three kinds of nickel electrodes modified by cobalt was operated including physical mixture , chemical deposition and covering cobalt .
研究了用物理掺杂、化学镀、包覆等三种方式饰钴后的镍电极的性能。
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