chemical vapor deposition film 化学汽相淀积膜
chemical vacuum thin-film deposition 化学真空薄膜沉积
chemical l vapor deposition film 化学汽相淀积膜
chemical vapor deposition diamond film 化学气相沉积金刚石薄膜
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.
用氢气、丙酮蒸汽为源气体，通过微波增强的化学气相沉积方法，实现了在金刚石表面气相外延生长单晶金刚石薄膜。
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